Prof.권광호

Education

03/78 - 02/85 : Bachelor’s Degree in Electrical Engineering, Korea University

03/85 - 02/78 : M. S in Electrical Engineering, Korea University

03/87 – 02/93 : Ph. D in Electrical Engineering (Electrical and Electronic Materials)
                          Ph. D. Thesis : “Characterization of Silicon Contamination and damage caused by reactive ion
                          etching and its removal”
                          Ph. D. Supervisors : Prof. Yung-Kwon Sung
                          Dissertation defined : Feb. 25, 1993

Work Experience

02/87 – 03/95 : Senior Researcher in Electronics and Telecommunication Research Institute (ETRI)

02/95 – 03/05 : Associate Professor in Hanseo University

01/04 – 12/04 : General Director of The Korean Institute of Electrical and Electronic Material Engineers (KIEEME)

01/08 – 12/08 : Financial Director of KIEEME

01/12 – 12/12 : Member of Chungnam Future Plan Committee

02/12 – 01/14 :

현재까지 총 SCI 149편 / SCIE 2편 / 국내논문 18편을 발표하였으며,

최근 3년간 20편의 SCI 논문을 Carbon / Applied Surface Science / Journal of Materials Chemistry A등 각 분야에 권위 있는 저널지에 게재하였음.

(최근 3년간 게재된 논문은 아래와 같음.)

2015

1. Inwoo Chun, Alexander Efremov, Geun Young Yeom, and Kwang-Ho Kwon “A Comparative Study of
    CF4/O2/Ar and C4F8/O2/Ar Plasmas for Dry Etching Applications” Thin Solid Films, 579 (2015) 136-143

2. Jaemin Lee, Junmyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Anti-adhesive characteristics of CHF3/O2
    and C4F8/O4 plasma-modified silicon molds for nanoimprint lithography, Materials Research Bulletin 69
    (2015)120-125 September

3. Kwangsoo Kim, Alexander Efremov, Junmyung Lee, Geun Young Yeom, and Kwang-Ho Kwon “Etching
    Mechanisms of (In, Ga, Zn)O Thin Films in CF4/Ar/O2 Inductively Coupled Plasma, JVST A, published 26
    February 2015

4. Junmyung Lee, Alexander Efremov, Jaemin Lee, Geun Young Yeom, and Kwang-Ho Kwon, “Silicon Surface
    Modification Using C4F8 + O2 Plasma for nano-Implant Lithography”, J. Nanosci. Nanotechnol. 15, 8749-
    8755,(2015)

5. Junmyung Lee, Alexander Efremov, Geun Young Yeom, Nomin Lim and Kwang-Ho Kwon, “Application of Si
    and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns”,
     J. Nanosci. Nanotechnol. 15, 8340-8347, (2015)

6. Alexander Efremov, Joon Hyub, and Kwang-Ho Kwon, “A Model-Based Comparative Study of HCl and HBr
    Plasma Chemistries for Dry Etching Purposes”, Plasma chemistry and plasma processing , 35(6), p1129-
    1142 (2015)

2016

7. Chang-Sun Park, Hong-Sub Lee, Dong Il Shim, Hyung hee Cho, Hyung-Ho Park and Kwang-Ho Kwon, “Oxygen-deficiency-dependent Seebeck coefficient and electrical properties of mesoporous La0.7Sr0.3MnO3-x films”, Journal of Materials Chemistry A, 4, 4433-4439 (2016)

8. Jamin Lee, Alexander Efremov, Ryeo Gang Son, Seung Pil Pack, Hyun Woo Lee, Kwangsoo Kim and Kwang-Ho Kwon, “Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization”, Carbon, 105, p430-437 (2016)

9. Junmyung Lee, Alexander Efremov, Byung Jun Lee, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas”, Plasma chemistry and plasma processing , 36, p1571-1588 (2016)

10. Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016)

11. Jaemin Lee, Alexander Efremov, Junmyung Lee, Kwangsoo Kim, and Kwang-Ho Kwon, Etching Characteristics of Carbon Nanotube Thin Films in O2/Ar Plasma”, J. Nanosci. Nanotechnol. 16,12021-12027 (2016)

12. Byung Jun Lee, Boung Jun Lee, Alexander Efremov, Ji-Woon Yang, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of MoS2 2D Crystals in O2/Ar Inductively Coupled Plasma”, J. Nanosci. Nanotechnol. vol. 16, 11201-11209 (2016)

13. Yong Geun Kim, Jummyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Etching Chracteristics of Graphene Film for Electronic Devices Using Inductively Coupled Plasma”, J. Nanosci. Nanotechnol. 16,11986-11991 (2016)

14. Woojae Han, Byungwook Yoo, Kwang-Ho Kwon, Hyung Hee Cho, and Hyung-Ho Park, “Fluorine ligand exchange effect in poly(vinylidenefluoride-co-hexafluoropropylene) with embedded fluorinated barium titanate nanoparticles” Thin Solid Films, Vol 619, 17-24 (2016)

2017

15. Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Surface Modification Due to Plasma Treatment of an Aluminum Electrode for a Triboelectric Generator”, J. Nanosci Nanotechnol. vol. 17, 3328-3332 (2017)

16. Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Inductively Coupled Plasma Surface Modification of Polyethylene Terephthalate and Application in a Triboelectric Generator” Thin Solid Films, Vol. 637, 27-31(2017)

17. Alexander Efremov, Junmyung Lee and Kwang-Ho Kwon, “A comparative study of CF4, Cl2 and HBr +Ar Inductively coupled plasmas for dry etching applications”, Thin Solid Films, vol.629, 39-48 (2017)

18. Jongchan Lee, Alexander Efremov, Kwangsoo Kim, and Kwang-Ho Kwon, “On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N2/Ar Inductively Coupled Plasma” Plasma Chem. Plasma Process, Vol. 37(2), 489-509 (2017)

19. Boung Jun Lee, Byung Jun Lee, Jongchan Lee, Ji-Woon Yang, and Kwang-Ho Kwon, “Effects of plasma treatment on the electrical reliability of multilayer MoS2 field-effect transistors”, Thin Solid Films, vol.637, 32-36 (2017)

20. Yong Geun Kim, Nomin Lim, Jihun Kim, Changmok Kim, Junmyung Lee, Kwang-Ho Kwon, “Study on the surface energy characteristics of polydimethylsiloxane (PDMS) films modified by C4F8/O2/Ar plasma treatment”, Applied Surface Science, Online published, (2017).